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首页> 外文期刊>IEEE Transactions on Electron Devices >Anisotropic Quantum Corrections for 3-D Finite-Element Monte Carlo Simulations of Nanoscale Multigate Transistors
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Anisotropic Quantum Corrections for 3-D Finite-Element Monte Carlo Simulations of Nanoscale Multigate Transistors

机译:纳米级多栅极晶体管的3-D有限元蒙特卡罗模拟的各向异性量子校正

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Anisotropic 2-D Schrödinger equation-based quantum corrections dependent on valley orientation are incorporated into a 3-D finite-element Monte Carlo simulation toolbox. The new toolbox is then applied to simulate nanoscale Si Silicon-on-Insulator FinFETs with a gate length of 8.1 nm to study the contributions of conduction valleys to the drive current in various FinFET architectures and channel orientations. The 8.1 nm gate length FinFETs are studied for two cross sections: rectangular-like and triangular-like, and for two channel orientations: and . We have found that quantum anisotropy effects play the strongest role in the triangular-like channel device increasing the drain current by % and slightly decreasing the current by 2% in the rectangular-like channel device. The quantum anisotropy has a negligible effect in any device with the channel orientation.
机译:依赖于山谷方向的基于各向异性2DSchrödinger方程的量子校正被合并到3D有限元蒙特卡洛模拟工具箱中。然后,该新工具箱将被用于模拟栅极长度为8.1 nm的纳米级绝缘体上硅硅FinFET,以研究在各种FinFET体系结构和沟道方向中传导谷对驱动电流的影响。针对两个截面(矩形和三角形)以及两个沟道方向:研究了8.1 nm栅极长度FinFET。我们已经发现,量子各向异性效应在三角形通道器件中起最强的作用,在矩形通道器件中,漏极电流增加%,而电流稍微减小2%。量子各向异性在具有沟道取向的任何器件中的影响都可以忽略不计。

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