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首页> 外文期刊>IEEE Electron Device Letters >Phase-Noise Improvement of GaAs pHEMT K-Band Voltage-Controlled Oscillator Using Tunable Field-Plate Voltage Technology
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Phase-Noise Improvement of GaAs pHEMT K-Band Voltage-Controlled Oscillator Using Tunable Field-Plate Voltage Technology

机译:利用可调场板电压技术改善GaAs pHEMT K波段压控振荡器的相位噪声

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摘要

This letter presents a voltage-controlled oscillator (VCO) with low phase-noise performance by applying tunable field-plate (FP) voltage on 0.15-$muhbox{m}$ -gate-length GaAs pseudomorphic high-electron-mobility transistors (pHEMTs). In this letter, the FP metal between gate and drain terminals was connected to a single pad and was controlled by an extra voltage supplier $(V_{rm FP})$. Owing to the depth modulation of FP-induced depletion region at various FP voltages, the device flicker noise was also improved by applying negative $V_{rm FP}$. This technique is convenient to be applied in standard pHEMT fabrication and particularly attractive for reducing the phase noise of VCO design without extra power consumption. A tunable phase-noise inductor–capacitor feedback 21-GHz VCO was demonstrated. The measured phase noise of this novel design is $-$95 dBc/Hz at an offset frequency of 1 MHz, and this value can be improved to $-$99.6 dBc/Hz at $V_{rm FP}$ of $-$ 5.5 V. The core dc-power consumption of this circuit is 30.8 mW.
机译:这封信提出了一种低相位噪声性能的压控振荡器(VCO),方法是在0.15- $ muhbox {m} $-栅长GaAs伪形高电子迁移率晶体管(pHEMTs)上施加可调场板(FP)电压)。在这封信中,栅极和漏极端子之间的FP金属连接到单个焊盘,并由额外的电压源$(V_ {rm FP})$控制。由于在各种FP电压下FP引起的耗尽区的深度调制,通过施加负的$ V_ {rm FP} $也可以改善器件的闪烁噪声。此技术可方便地应用于标准pHEMT制造中,并且对于降低VCO设计的相位噪声而无额外功耗特别有吸引力。演示了可调谐的相位噪声电感器-电容器反馈21 GHz VCO。这种新颖设计的实测相位噪声在1 MHz偏移频率下为$-$ 95 dBc / Hz,在$-$ 5.5 V的$ V_ {rm FP} $时,该值可以提高到$-$ 99.6 dBc / Hz。该电路的核心直流功耗为30.8 mW。

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