首页> 外文期刊>Electron Device Letters, IEEE >InGaN-Based High-Power Flip-Chip LEDs With Deep-Hole-Patterned Sapphire Substrate by Laser Direct Beam Drilling
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InGaN-Based High-Power Flip-Chip LEDs With Deep-Hole-Patterned Sapphire Substrate by Laser Direct Beam Drilling

机译:基于InGaN的大功率倒装芯片LED及其深孔图案蓝宝石衬底的激光直接光束钻孔

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摘要

A high-performance flip-chip light-emitting diode (LED) with deep-hole-patterned sapphire substrate was fabricated by laser direct beam drilling. The output power of the LED was measured to be as high as 145 mW at a forward current of 350 mA, which is improved by 19% compared to that of the reference LED. This significant enhancement of the LED with deep-hole-patterned sapphire is attributed to the increase of extraction efficiency, resulting from the increase in photon escape probability due to enhanced light scattering at the deep-hole pattern.
机译:通过激光直接光束钻孔,制造了具有深孔图案蓝宝石衬底的高性能倒装芯片发光二极管(LED)。在350 mA的正向电流下,LED的输出功率被测得高达145 mW,与参考LED的功率相比提高了19%。具有深孔图案蓝宝石的LED的显着增强归因于提取效率的提高,这归因于由于深孔图案处光散射增强而导致的光子逸出概率的增加。

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