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首页> 外文期刊>IEEE Electron Device Letters >A Traveling-Wave CMOS SPDT Using Slow-Wave Transmission Lines for Millimeter-Wave Application
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A Traveling-Wave CMOS SPDT Using Slow-Wave Transmission Lines for Millimeter-Wave Application

机译:毫米波应用中使用慢波传输线的行波CMOS SPDT

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摘要

In this letter, a traveling-wave single-pole double-throw (SPDT) switch using slow-wave coplanar waveguides is implemented in a 65-nm triple-well CMOS process. For performance improvement, double-well body-floating technique is used. The p-well layer and deep n-well layer of nMOSFET being, respectively, biased to ${-}{1.4}$ and 2.0 V, the measured SPDT exhibits an insertion loss of 2.8 dB and an isolation of 20 dB at 60 GHz. A measured input 1-dB compression point $(ICP_{rm 1dB})$ of 17 dBm is obtained at 35 GHz (16.3 dBm at 60 GHz by simulation). The total chip size is only 0.42 ${rm mm}^{2}$ (780 $mu{rm m}times,$540 $mu{rm m}$) including all testing pads.
机译:在这封信中,使用慢波共面波导的行波单刀双掷(SPDT)开关是在65nm三阱CMOS工艺中实现的。为了提高性能,使用了双井体漂浮技术。 nMOSFET的p阱层和深n阱层分别被偏置为 $ {-} {1.4} $ $(ICP_ {rm 1dB})$ 通过仿真在60 GHz时为16.3 dBm)。总筹码大小仅为0.42 $ {rm mm} ^ {2} $ (780 $ mu {rm m}次,$ 540 $ mu {rm m} $ ),包括所有测试板。

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