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首页> 外文期刊>Electron Device Letters, IEEE >A U-Gate InGaAs/GaAsSb Heterojunction TFET of Tunneling Normal to the Gate With Separate Control Over ON- and OFF-State Current
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A U-Gate InGaAs/GaAsSb Heterojunction TFET of Tunneling Normal to the Gate With Separate Control Over ON- and OFF-State Current

机译:垂直于栅极隧穿的U-Gate InGaAs / GaAsSb异质结TFET,具有对通态和关态电流的独立控制

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摘要

A U-gate vertical tunneling field-effect transistor (TFET) of band-to-band tunneling (BTBT) normal to the gate at low operation voltages is proposed and investigated by TCAD simulation. In this structure, drive current and OFF-state leakage current can be separately controlled by the insertion of a spacer layer between the channel and drain layers. The dominant mechanisms for drive current and OFF-state leakage are BTBT and source-to-drain tunneling (SDT), respectively. A modified structure of side gates and a hetero-spacer enables high-performance InGaAs/GaAsSb heterojunction TFETs with low OFF-state leakage. Drive current as high as 520 μA/μm with an ION/IOFF ratio of 107 at an overdrive voltage of 0.3 V was achieved in an InGaAs/GaAsSb heterojunction TFET of a small effective bandgap (0.02 eV). Furthermore, this U-gate TFET structure is fully compatible to VLSI technology without any complicated fabrication steps.
机译:提出了在低工作电压下垂直于栅极的带间隧穿(BTBT)的U栅垂直隧穿场效应晶体管(TFET),并通过TCAD仿真进行了研究。在这种结构中,可以通过在沟道层和漏极层之间插入隔离层来分别控制驱动电流和截止状态泄漏电流。驱动电流和截止状态泄漏的主要机制分别是BTBT和源漏隧道(SDT)。侧栅和异质隔离物的改进结构可实现高性能的InGaAs / GaAsSb异质结TFET,具有低的关态泄漏。在0.3 V的过驱动电压下,驱动电流高达520μA/μm,I ON / I OFF 比为10 7 InGaAs / GaAsSb异质结TFET中的有效带隙很小(0.02 eV)。此外,这种U栅TFET结构与VLSI技术完全兼容,而无需任何复杂的制造步骤。

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