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首页> 外文期刊>IEEE Electron Device Letters >High-Voltage ( 2¯¯¯01 ) β -Ga2O3 Vertical Schottky Barrier Diode With Thermally-Oxidized Termination
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High-Voltage ( 2¯¯¯01 ) β -Ga2O3 Vertical Schottky Barrier Diode With Thermally-Oxidized Termination

机译:具有热氧化终端的高压(2¯01)β-Ga2O3垂直肖特基势态势码

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摘要

In this letter, a high-performance ((2) over bar 01) beta-Ga2O3 vertical Schottky Barrier Diode (SBD) with a thermally oxidized termination is reported. A novel edge termination at the Schottky contact edge is formed by using thermal oxidation treatment, which reduces the electron concentration and effectively suppresses the peak electric field. By using a thermal oxidation termination, the breakdown voltage (V-br) of beta-Ga2O3 SBD increases from 380 V to 940 V, and the specific on-resistance (R-on,R- sp) just increases from 2.9 m Omega.cm(2) to 3.0 m Omega.cm(2). Our device demonstrates a power figure of merit (V-br(2)/R-on,R- sp) as high as 295 MW/cm(2). These results indicate that the thermally oxidized termination shows a new way to improve the breakdown characteristics of beta-Ga2O3 SBD.
机译:在这封信中,报道了具有热氧化终止的高性能((2)上方的条形图01)β-Ga2O3垂直肖特基势垒二极管(SBD)。通过使用热氧化处理形成在肖特基接触边缘处的新颖边缘终端,这降低了电子浓度并有效地抑制了峰值电场。通过使用热氧化终止,β-GA2O3 SBD的击穿电压(V-BR)从380 V至940V增加,并且特定的导通电阻(R-ON,R-SP)刚从2.9M OMEGA增加。 cm(2)至3.0 m omega.cm(2)。我们的设备演示了高达295 mW / cm(2)的功率数字(V-Br(2)/ R-ON,R-SP)的功率数字。这些结果表明,热氧化终端显示了改善β-GA2O3 SBD的击穿特性的新方法。

著录项

  • 来源
    《IEEE Electron Device Letters》 |2020年第1期|131-134|共4页
  • 作者单位

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

    Chinese Acad Sci Inst Microelect Key Lab Microelect Devices & Integrat Technol Beijing 100029 Peoples R China;

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

    Univ Sci & Technol China Sch Microelect Hefei 230026 Anhui Peoples R China;

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

    Hebei Semicond Res Inst Natl Key Lab ASIC Shijiazhuang 050051 Hebei Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Ga2O3 SBD; thermal oxidation; breakdown voltage; peak electric field;

    机译:GA2O3 SBD;热氧化;击穿电压;峰值电场;

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