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Characterization of CVD Diamond Thin Film Electrodes in Terms of their Semiconductivity

机译:CVD金刚石薄膜电极的半导电性表征

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摘要

A series of boron-doped diamond films were grown using hot filament technique, over wide doping level ranges. Their semiconductor characteristics (the uncompensated acceptor concentration and flat band potential) were determined from Mott–Schottky plots measured by electrochemical impedance spectroscopy. These parameters can be used for the films’ characterization. The applicability of the electrochemical impedance spectroscopy approach in the semiconductor diamond characterization is discussed.
机译:在较宽的掺杂水平范围内,使用热丝技术生长了一系列掺硼金刚石薄膜。它们的半导体特性(未补偿的受体浓度和平坦带电势)由电化学阻抗谱法测量的Mott-Schottky图确定。这些参数可用于电影的刻画。讨论了电化学阻抗谱方法在半导体金刚石表征中的适用性。

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