TENSILE TESTING OF FREE-STANDING Cu, Ag AND Al THIN FILMS AND Ag/Cu MULTILAYERS

摘要

Free standing polycrystalline thin films with a strong〈111〉texture were tested in uniaxial ten- sion. Studied were electron-beam deposited Ag, Cu and Al films, and Ag/Cu multilayers consisting of alter- nating Ag and Cu layers of equal thickness, between 1.5 nm and 1.5μm(bilayer repeat length, γ, between 3 nm and 3μm). The films had a total thickness of about 3μm. A thin polymeric two-dimensional diffrac- tion grid was deposited on the film surface by microlithographic techniques.