The Effects of Substrate Bias on the Properties of HfC Coatings Deposited by RF Magnetron Sputtering

摘要

In the paper, by using radio frequency (RF) magnetron sputter technology, the HfC coating grew on a 316L stainless steel substrate in an Ar atmosphere at various substrate bias voltages from 0 to ?200 V. From the X-ray diffraction (XRD) and transmission electron microscopy (TEM) experiments, the HfC coatings were well crystallized and (111) preferential growth had been successfully obtained by controlling bias voltage at ?200 V. Nanoindentation experimental results for the prepared HfC coatings indicated that they possessed the maximum nanohardness due to the formation of the (111) orientation. The results of electrochemical measurements displayed that 316L stainless steel (316L) coated with the HfC coatings had better corrosion resistance than bare 316L. With the bias voltage increasing to ?200 V, adhesion of the 316L substrate with the HfC coating could be greatly improved, as well as corrosion resistance. The antithrombogenicity of the HfC coatings was identified by platelet adhesive and hemolytic ratio assay in vitro. It was shown that the hemocompatibility of coated 316L had been improved greatly compared with bare 316L and the HfC coatings possessed better antithrombogenicity with the bias voltage elevating above ?150 V.