Preparation of HfO2–Al2O3 nanocomposite films using chemical vapor deposition

摘要

We prepared HfO 2 –Al 2 O 3 nanocomposite films using chemical vapor deposition. Fibrous and lamellar microstructures formed in the monoclinic and tetragonal HfO 2 ( m / t -HfO 2 )–α-Al 2 O 3 films at deposition temperature of 1573 K and Al mole fraction in the precursor vapor of 36–74 mol %Al 2 O 3 . Characterization by electron microscopy revealed that the m / t -HfO 2 fibrous and lamellar structures are present throughout the α-Al 2 O 3 columnar matrix above 50 mol %Al 2 O 3 (55 vol %Al 2 O 3 ), while α-Al 2 O 3 lamellar structure was formed in m -HfO 2 matrix below 50 mol %Al 2 O 3 .