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Direct-ARPES and STM Investigation of FeSe Thin Film Growth by Nd:YAG Laser

机译:ND:YAG激光器的遗传薄膜生长的直射和STM调查

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Research on ultrathin quantum materials requires full control of the growth and surface quality of the specimens in order to perform experiments on their atomic structure and electron states leading to ultimate analysis of their intrinsic properties. We report results on epitaxial FeSe thin films grown by pulsed laser deposition (PLD) on CaF2 (001) substrates as obtained by exploiting the advantages of an all-in-situ ultra-high vacuum (UHV) laboratory allowing for direct high-resolution surface analysis by scanning tunnelling microscopy (STM), synchrotron radiation X-ray photoelectron spectroscopy (XPS) and angle-resolved photoemission spectroscopy (ARPES) on fresh surfaces. FeSe PLD growth protocols were fine-tuned by optimizing target-to-substrate distance d and ablation frequency, atomically flat terraces with unit-cell step heights are obtained, overcoming the spiral morphology often observed by others. In-situ ARPES with linearly polarized horizontal and vertical radiation shows hole-like and electron-like pockets at the Γ and M points of the Fermi surface, consistent with previous observations on cleaved single crystal surfaces. The control achieved in growing quantum materials with volatile elements such as Se by in-situ PLD makes it possible to address the fine analysis of the surfaces by in-situ ARPES and XPS. The study opens wide avenues for the PLD based heterostructures as work-bench for the understanding of proximity-driven effects and for the development of prospective devices based on combinations of quantum materials.
机译:超薄量子材料的研究需要完全控制标本的生长和表面质量,以便对其原子结构和电子状态进行实验,导致其内在特性的最终分析。我们通过利用允许直接高分辨率表面的优点来获得CAF2(001)衬底上的脉冲激光沉积(PLD)在CAF2(001)衬底上产生的外延FESE薄膜的结果通过扫描隧道显微镜(STM),同步辐射X射线光电子能谱(XPS)和XPS)和角度分辨的光曝光光谱(ARPES)在新鲜表面上进行分析。通过优化目标 - 基质距离D和消融频率,获得具有单位细胞步高度的原子平梯度来进行微调的FESE PLD生长方案进行微调,克服了其他人经常观察到的螺旋形态。使用线性偏振的水平和垂直辐射的原位ARPE显示出在FERMI表面的γ和M点处的空穴状和电子样口袋,与先前的切割单晶表面的观察结果一致。通过原位PLD使用诸如SE的挥发性元件的挥发性元件生长量子材料的控制使得可以通过原位的ARPE和XPS来解决表面的精细分析。该研究为PLD的异质结构开辟了宽阔的途径,作为理解接近驱动的效果和基于量子材料组合的前瞻性设备的开发的工作台。

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