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首页> 外文期刊>RSC Advances >The effects of nonmetal dopants on the electronic, optical, and catalytic performances of monolayer WSe2 by a first-principles study
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The effects of nonmetal dopants on the electronic, optical, and catalytic performances of monolayer WSe2 by a first-principles study

机译:一种非金属掺杂剂对单层WSE2的电子,光学和催化性能的第一原理研究

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Doping modifies the electronic, optical, and catalytic behavior of materials through the newly formed chemical bonds and the localized electrons. With the aid of first-principles calculations, the electronic, optical, and catalytic performances of the nonmetal (NM = H, B, C, N, O, F, Si, P, S, Cl, As, Br, Te, or I)-doped monolayer WSe _(2) were investigated. The results showed that the NM dopants substitute preferentially for Se under a W-rich condition and H, F, Cl, Br, and I atoms are willing to locate at the interstitial site. The electron-clouds around the dopants and nearby W or Se atoms were altered by the newly formed W–NM or Se–NM bonds, with the differences determined by the bonding strength between them. The band gap, optical absorption edge, and intensities were altered or shifted by less than 0.08 eV, 32 nm, and 9.5%, respectively. The H, F, P, Cl, As, Br, and I dopants were conductive to separating the photogenerated e ~(?) /h ~(+) pairs, whereas the B, C, Si, and Te dopants became recombination centers for the photogenerated e ~(?) /h ~(+) pairs. Compared with pristine monolayer WSe _(2) , NM atoms with odd free electrons reduced the reduction potential by 0.39–0.71 eV and enhanced the oxidation potential by 0.45–0.75 eV. Thus, we can adjust the redox potentials of monolayer WSe _(2) by introducing different kinds of NM impurities for various catalytic reactions, and the H-, F-, P-, Cl-, As-, Br-, and I-doped specimens have excellent photocatalysis capability.
机译:掺杂通过新形成的化学键和局部电子改变材料的电子,光学和催化行为。借助于第一原理计算,非金属的电子,光学和催化性能(NM = H,B,C,N,O,F,Si,P,S,Cl,As,Br,Te或i)研究了单层WSE _(2)。结果表明,NM掺杂剂优先于富含W的条件和H,F,CL,BR,H,I原子替代SE,并且I原子愿意在间质部位定位。通过新形成的W-NM或SE-NM键改变掺杂剂和附近的W或SE原子周围的电子云,其差异由它们之间的粘合强度决定。带隙,光学吸收边缘和强度分别被更换或移位小于0.08eV,32nm和9.5%。 H,F,P,Cl,Br和I掺杂剂是导电的,以分离光生E〜(?)/ h〜(+)对,而B,C,Si和Te掺杂剂成为重组中心光生E〜(?)/ h〜(+)对。与原始单层WSE _(2)相比,具有奇数自由电子的NM原子将降低电位降低0.39-0.71eV,并通过0.45-0.75eV提高氧化电位。因此,我们可以通过引入各种催化反应的不同种类的NM杂质和H-,F-,P-,CL-,AS-,BR-和I-来调节单层WSE _(2)的氧化还原电位,以及掺杂的标本具有优异的光催化能力。

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