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Tunable spin-polarized band gap in Si2/NiI2 vdW heterostructure

机译:Si2 / Nii2 VDW异质结构的可调旋转偏振带隙

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Using density functional theory (DFT) calculations we investigate the structural and electronic properties of a heterogeneous van der Waals (vdW) structure consisting of silicene and NiI _(2) single layers. We observe an interaction between the two layers with a net charge transfer from the ferromagnetic semiconductor NiI _(2) to silicene, breaking the inversion symmetry of the silicene structure. However, the charges flow in opposite directions for the two spin channels, which leads to a vdW heterostructure with a spin-polarized band gap between the π and π* states. The band gap can be tuned by controlling the vertical distance between the layers. The features shown by this vdW heterostructure are new, and we believe that silicene on a NiI _(2) layer can be used to construct heterostructures which have appropriate properties to be used in nanodevices where control of the spin-dependent carrier mobility is necessary and can be incorporated into silicon based electronics.
机译:使用密度泛函理论(DFT)计算,我们研究了由硅和NiI _(2)单层组成的异质VAN DAR WAALS(VDW)结构的结构和电子性质。我们观察到两层之间的相互作用,从铁磁半导体Nii _(2)与硅中的净电荷转移到硅,断开硅结构的反转对称。然而,电荷在两个自旋通道的相反方向上流动,这导致VDW异质结构,其中π和π*态之间的旋转偏振带隙。可以通过控制层之间的垂直距离来调谐带隙。该VDW异质结构所示的特征是新的,并且我们认为Nii _(2)层上的硅片可用于构建具有在纳米纳米切口中使用的适当性能的异质结构,其中需要控制自旋依赖性载流子迁移率可以结合到基于硅基电子中。

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