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Evaluation of residual antimicrobial activity of flumequine solutions subjected to electrochemical and photo-electrochemical processes

机译:对电化学和光电化学工艺进行烟道溶液的残留抗菌活性的评价

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Flumequine degradation by electrochemical and photo-electrochemical processes was evaluated in this study. The antimicrobial activity of the solutions subjected to the electrochemical processes was monitored during the assays. The experiments were carried out using DSA® (dimensionally stable anode) electrode. The influence of current density was investigated for the 7.5 to 45 mA cm-2 range. The photo-electrochemical process was more efficient for degrading flumequine (85%) and reducing solution antimicrobial activity. For both processes, the residual antimicrobial activity decreased as flumequine degradation increased. The reaction intermediate m/z 244 (5-methyl-1-oxo-6,7-dihydro-1H,5H-pyrido[3,2,1-ij]quinoline-2-carboxylic acid) was identified.
机译:在本研究中评估了电化学和光电化学方法的卷素降解。在测定期间监测经受电化学方法的溶液的抗微生物活性。使用DSA®(尺寸稳定的阳极)电极进行实验。研究了电流密度的影响,针对7.5至45mA cm-2范围进行了研究。光电化学过程更有效地降解FLUMEQUINE(85%)并降低溶液抗微生物活性。对于这两种方法,随着FLUMEQUINE降解增加,残留的抗微生物活性降低。确定反应中间体M / Z 244(5-甲基-1-氧代-6,7-二氢-1H,5H-吡啶[3,2,1-IJ]喹啉-2-羧酸)。

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