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rheed++: A C++ framework to simulation of RHEED intensity oscillations during the growth of thin epitaxial films

机译:Rheed ++:在薄外延薄膜生长期间,用于模拟Rheed强度振荡的C ++框架

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A time-efficient, compact and flexible computer model has been developed for calculations of RHEED intensity oscillations during the growth of thin epitaxial films. The main functionality of the model is its ability to perform dynamical calculations of amplitude of the RHEED specular beam intensity oscillations as a function of growth time using the scattering potential for heteroepitaxial structures, accounting for the possible occurrence of diffuse scattering through the layer parallel to the surface. The existence of a large number of user-definable parameters make the presented model highly versatile. To validate the model, a calculated plot of the RHEED oscillation has been compared with experimental data taken from the literature. The model does not require linking to any of the existing numerical library routines.
机译:已经开发了一种时间效率,紧凑且柔性的计算机模型,用于在薄外延薄膜的生长期间计算RAEED强度振荡的计算。该模型的主要功能是其能够作为使用异质结构的散射电位的散射电位作为生长时间的函数来执行Rapefuls梁强度振荡幅度的动态计算,占通过平行层的层散射的可能出现漫射散射的发生表面。存在大量用户可定义参数的存在使呈现的模型高度通用。为了验证模型,已经将Rheed振荡的计算图与从文献中取出的实验数据进行了比较。该模型不需要链接到任何现有的数字库例程。

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