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Changes in surface morphology of helium-induced tungsten nanostructure during high-temperature annealing

机译:高温退火过程中氦诱导钨纳米结构表面形态的变化

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When exposed to high-flux helium plasmas, tungsten is known to develop a surface nanostructure called tungsten fuzz. Although there exists a consensus for the general mechanisms that lead to this nanostructure, a number of questions regarding its formation have yet to be addressed. One common approach to investigate helium-tungsten interactions is thermal desorption spectroscopy (TDS), as TDS can offer insight into the trapping of helium in tungsten that ultimate drives the nanostructure growth. However, during TDS, the surface morphology of the tungsten nanostructure can change dramatically at temperatures substantially lower than those required to fully desorb the trapped helium. For a comprehensive interpretation of TDS spectra, the helium release from trapping sites should be disentangled from complications that may arise from the changing surface morphology. In this work, we characterize the effects of high-temperature annealing on the surface morphology of tungsten nanostructure during TDS. Six ITER-grade W samples were exposed to helium plasma under identical conditions (a He ion fluenceΦi=8.6×1024m?2,ion energy of 90?eV, and sample temperature of 1123?K) to generate similar surface nanostructures on each sample. Samples were then annealed at various temperatures for different durations to determine the impact of annealing temperature and duration on the surface nanostructure. During annealing, TDS spectra of the He release rate were obtained using a quadrupole mass spectrometer, yielding He release peaks near 373?K and 1123?K. Changes to the surface morphology were observed on samples annealed at temperatures as low as 1173?K, using a combination of spectroscopic ellipsometry and helium ion microscopy with focused ion beam profiling.
机译:当暴露于高通量氦等离子体时,已知钨制成一种称为钨模糊的表面纳米结构。虽然导致该纳米结构的一般机制存在共识,但尚未解决了关于其形成的若干问题。调查氦钨相互作用的一种常见方法是热解吸光谱(TDS),因为TDS可以在钨中汲取氦气的培养,这是最终推动纳米结构的生长的洞察力。然而,在TDS期间,钨纳米结构的表面形态可以在基本上低于完全解吸捕获氦所需的温度下显着变化。对于TDS光谱的全面解释,捕获位点的氦释放应与可能从变化的表面形态产生的并发症中脱节。在这项工作中,我们表征了高温退火在TDS期间钨纳米结构表面形态的影响。在相同的条件下将六个浸渍级W样品暴露于氦血浆(HE离子流量φi= 8.6×1024m→2,离子能量为90°EEV,以及1123Ω·k的样品温度),以在每个样品上产生类似的表面纳米结构。然后在不同持续时间的各种温度下退火样品以确定退火温度和持续时间在表面纳米结构上的影响。在退火期间,使用四极谱质谱仪获得HE释放速率的TDS光谱,得到他释放峰值,靠近373〜K和1123?K.在低至1173Ω·k的温度下的样品上观察到对表面形态的变化,使用光谱椭圆形和氦离子显微镜的组合,具有聚焦离子束分析。

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