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Enhancement of Gas Barrier Properties of Graphene Oxide/Poly (Lactic Acid) Films Using a Solvent-free Method

机译:使用无溶剂方法提高石墨烯/聚(乳酸)膜的气体阻隔性能

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Graphene oxide(GO)/polylactic acid (PLA) nanocomposite, prepared using a solvent-free melt mixing processing, is investigated as a potential oxygen barrier packaging film in this work. In order to disperse GO homogeneously in PLA matrix, hydrophobic silane coupling agent, i.e., γ-(2,3-epoxypropoxy)propyltrimethoxysilane (KH560), is used to modify the graphene oxide sheets. The modified GO is able to be well bonded to the PLA due to the formation of covalent bonds between the epoxy groups of KH560 and the carboxyl and hydroxyl terminal groups of PLA. Furthermore, the thermal stability of GO is enhanced due to the long alkyl side chain of KH560, which could also increase the crystallinity of PLA. As a result, the crystallinity of PLA is significantly improved because of the linear KH560 chains, which can act as nucleating agents to improve the crystallization. The KH560-GO helps to reduce the O 2 permeability of KH560-GO/PLA composite films via a dual-action mechanism: (1) providing physical barrier due to their native barrier properties, and (2) by resulting in higher degree of crystallinity. The as-prepared KH560-GO0.75/PLA is able to exhibit ca. 33% and ca. 13% decrease in the P O2 than the neat PLA and GO0.75/PLA film, respectively. Finally, the mechanical properties and impact fractured surfaces indicate that the increase in the tensile strength and elongation at break value of KH560-GO/PLA are due to the strong interfacial adhesion and the strong bonding between the epoxy group of KH560-GO and hydroxyl and carboxyl acid terminal groups of PLA matrix.
机译:使用无溶剂熔融混合加工制备的石墨烯氧化物(GO)/聚乳酸(PLA)纳米复合材料在这项工作中作为潜在的氧气阻隔包装膜进行研究。为了在PLA基质中分散均匀,疏水性硅烷偶联剂,即γ-(2,3-环氧丙氧基)丙基三甲氧基硅烷(KH560)用于改性石墨烯氧化物片。由于KH560的环氧基团与PLA的羧基和羟基末端基团之间的共价键形成,改性的Go能够充分粘合到PLA。此外,由于KH560的长烷基侧链,Go的热稳定性增强,这也可以增加PLA的结晶度。结果,由于线性KH560链显着提高了PLA的结晶度,这可以充当成核剂以改善结晶。 KH560-GO有助于通过双动力机理降低KH560-GO / PLA复合膜的O 2渗透性:(1)由于其天然阻隔性能,通过其产生更高程度的结晶度,提供物理屏障。准备的KH560-GO0.75 / PLA能够展出CA. 33%和CA. P O2减少的13%,分别比整齐的PLA和GO0.75 / PLA膜减少。最后,机械性能和冲击破裂表面表明,KH560-GO / PLA断裂值的拉伸强度和伸长率的增加是由于KH560-GO和羟基的环氧基与羟基和羟基之间的强粘合PLA基质的羧酸末端基团。

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