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首页> 外文期刊>Materials >Evolution of Helium Bubbles and Discs in Irradiated 6H-SiC during Post-Implantation Annealing
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Evolution of Helium Bubbles and Discs in Irradiated 6H-SiC during Post-Implantation Annealing

机译:植入后退火期间辐照6H-SiC氦气泡沫和圆盘的演变

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摘要

The single crystal 6H-SiC with [0001] crystal direction irradiated by 400 keV He + ions with 1 × 10 17 ions/cm 2 fluence at 400 °C were annealed at 600, 900, 1200 and 1400 °C for different durations. The evolution of helium bubbles and discs was investigated by transmission electron microscopy. An irradiated layer distributed with fine helium bubbles was formed with a width of ~170 nm after helium ion irradiation. The size of gas bubbles increased with increasing annealing time and temperature and finally reached stable values at a given annealing temperature. According to the relationship between the bubble radii and annealing time, an empirical formula for calculating the bubble radii at the annealing temperature ranged from 600 to 1400 °C was given by fitting the experiment data. Planar bubble clusters (discs) were found to form on (0001) crystal plane at both sides of the bubble layer when the annealing temperature was at the range of 800–1200 °C. The mechanism of bubble growth during post-implantation annealing and the formation of bubble discs were also analyzed and discussed.
机译:用1×10 17离子/ cm 2注入400keV He +离子的晶体方向的单晶6h-SiC,在400℃下向600,900,1200和1400℃退火,以进行不同的持续时间。通过透射电子显微镜研究了氦气泡沫和盘的演变。在氦离子照射后形成具有细氦气泡的宽度为约170nm的辐照层。气泡的尺寸随着退火时间和温度的增加而增加,最后在给定的退火温度下达到稳定值。根据气泡半径和退火时间之间的关系,通过装配实验数据,给出了用于在退火温度下计算气泡半径的经验公式,通过拟合实验数据给出600至1400℃。当退火温度在800-1200℃的范围内时,发现在气泡层两侧的(0001)晶平面上形成平面气泡簇(盘)。还分析并讨论了植入后退火期间的气泡生长机理和泡沫盘的形成。

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