首页> 外文期刊>AIP Advances >Preparation, thermoelectric properties, and crystal structure of boron-doped Mg2Si single crystals
【24h】

Preparation, thermoelectric properties, and crystal structure of boron-doped Mg2Si single crystals

机译:硼掺杂Mg2SI单晶的制备,热电性能和晶体结构

获取原文
           

摘要

Mg 2 Si is a potential thermoelectric (TE) material that can directly convert waste energy into electricity. In expectation of improving its TE performance by increasing electron carrier concentration, the element boron (B) is doped in Mg 2 Si single crystals (SCs). Their detailed crystal structures are definitely determined by using white neutron holography and single-crystal x-ray diffraction (SC-XRD) measurements. The white neutron holography measurement proves that the doped B atom successfully substitutes for the Mg site. The SC-XRD measurement confirms the B-doping site and also reveals the presence of the defect of Si vacancy (V Si ) in the B-doped Mg 2 Si SCs. The fraction of V Si increases with increasing B-doping concentration. In the case of B-doped Mg 2 Si polycrystals (PCs), V Si is absent; this difference between the SCs and PCs can be attributed to different preparation temperatures. Regarding TE properties, the electrical conductivity, σ , and the Seebeck coefficient, S , decreases and increases, respectively, due to the decrease in the electron carrier concentration, contrary to the expectation. The power factor of the B-doped Mg 2 Si SCs evaluated from σ and S does not increase but rather decreases by the B-doping. The tendencies of these TE properties can be explained by considering that the donor effect of the B atom is canceled by the acceptor effect of V Si for the B-doped Mg 2 Si SCs. This study demonstrates that the preparation condition of Mg 2 Si should be optimized to prevent the emergence of an unexpected point defect.
机译:Mg 2 Si是一种潜在的热电(TE)材料,可以直接将废能转化为电力。期望通过增加电子载体浓度来改善其TE性能,元件硼(B)掺杂在Mg 2 Si单晶(SC)中。它们的详细晶体结构绝对通过使用白色中子全息和单晶X射线衍射(SC-XRD)测量来确定。白色中子全息测量证明掺杂的B原子成功替代Mg位点。 SC-XRD测量证实了B掺杂位点,并且还揭示了B掺杂Mg 2 Si SC中Si空位(V Si)的缺陷的存在。随着B掺杂浓度的增加,V SI的级分增加。在B掺杂Mg 2 Si多晶(PCS)的情况下,不存在V Si; SCS和PC之间的这种差异可归因于不同的制备温度。关于TE性能,电导率,σ和塞贝克系数,分别由于电子载体浓度的降低而分别减小和增加,与期望相反。从σ和S评估的B掺杂Mg 2 Si SC的功率因数不会增加,而是通过B掺杂增加。可以通过考虑通过对B掺杂的Mg 2 Si SCs的V Si的受体作用消除B原子的供体效应来解释这些TE性质的趋势。本研究表明,应优化Mg 2 Si的制备条件,以防止出现意外点缺陷。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号