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Analysis of substrate curvature and film stress through a reformed mathematical description on mismatch strain

机译:通过改革的数学描述对衬底曲率和薄膜应力分析失配菌株

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Stoney’s formula first related film stress to substrate curvature, but properties of film material were not contained in it, which was modified by Freund’s formula. In the derivation of Freund’s formula, a uniformly preassigned mismatch strain throughout film was adopted. For the epitaxial growth of film on substrate, the present paper suggests a different imagination that the deformation of the film-substrate system attributed to the mismatch between two crystals is produced in the following way: a coupled lattice constant emerged at the interface is shared by film and substrate, by which the interaction between film and substrate, and then the development of stress and strain fields in the bilayer structure are induced naturally. As a result, a theoretical model with a closed form for calculating the substrate curvature and the corresponding film stress has been established, the validity of which has been confirmed by compared with Stoney’s formula and Freund’s formula via examples. Our analysis is limited to the linear small deformation, but the new understanding on the mismatch strain can be extended to the nonlinear analysis on the large deformation.
机译:Stoney的公式首式相关膜压力对底物曲率,但它不含薄膜材料的性质,其被弗氏配方改性。在弗氏配方的推导中,采用薄膜均匀预测的不匹配应变。对于基板上的薄膜外延生长,本文提出了一种不同的想象力,即归因于两个晶体之间的错配的薄膜基板系统的变形是以下列方式产生的:在界面处出现的耦合晶格常数是共享的薄膜和基板,通过该薄膜和基板,自然诱导膜和基板之间的相互作用,然后在双层结构中的应力和应变场的发展。结果,已经建立了具有封闭形式的理论模型,用于计算基板曲率和相应的膜应力,通过通过实施例与Stoney的公式和弗氏配方相比已经确认了其有效性。我们的分析仅限于线性小变形,但是对不匹配应变的新理解可以扩展到大变形的非线性分析。

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  • 来源
    《AIP Advances》 |2018年第6期|共10页
  • 作者

    Qingsong Mu;

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