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首页> 外文期刊>Advances in condensed matter physics >Electronic Structure and Room Temperature of 2D Dilute Magnetic Semiconductors in Bilayer MoS2-Doped Mn
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Electronic Structure and Room Temperature of 2D Dilute Magnetic Semiconductors in Bilayer MoS2-Doped Mn

机译:双层MOS2掺杂Mn中的2D稀磁半导体的电子结构和室温

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摘要

The electronic structure and magnetic properties of manganese- (Mn-) doped bilayer (BL) molybdenum disulfide (MoS2) are studied using the density function theory (DFT) plus on-site Hubbard potential correction (U). The results show that the substitution of Mn at the Mo sites of BL MoS2 is energetically favorable under sulfur- (S-) rich regime than Mo. The magnetic interaction between the two manganese (Mn) atoms in BL MoS2 is always ferromagnetic (FM) irrespective of the spatial distance between them, but the strength of ferromagnetic interaction decays with atomic distance. It is also found that two dopants in different layers of BL MoS2 communicate ferromagnetically. In addition to this, the detail investigation of BL MoS2 and its counterpart of monolayer indicates that interlayer interaction in BL MoS2 affects the magnetic interaction in Mn-doped BL MoS2. The calculated Curie temperature is 324, 418, and 381?K for impurity concentration of 4%, 6.25%, and 11.11%, respectively, which is greater than room temperature, and the good dilute limit of dopant concentration is 0–6.25%. Based on the finding, it is proposed that Mn-doped BL MoS2 are promising candidates for two-dimensional (2D) dilute magnetic semiconductor (DMS) for high-temperature spintronics applications.
机译:使用密度函数理论(DFT)加上现场Hubbard潜在校正(U)研究锰 - (Mn-)掺杂双层(BL)二硫化钼(MOS2)的电子结构和磁性。结果表明,在BL MOS2的MO位点处的Mn替代在硫 - (S-)富裕的制度下能够充满活力,BL MOS2中的两个锰(MN)原子之间的磁性相互作用总是铁磁性(FM)无论它们之间的空间距离如何,但铁磁相互作用的强度衰减用原子距离。还发现,在BL MOS2的不同层中的两个掺杂剂在BOS2中连通铁磁。除此之外,BL MOS2及其单层的细节研究表明BL MOS2中的层间相互作用影响了MN掺杂BL MOS2中的磁相互作用。计算的居里温度为324,418和381Ω,杂质浓度分别为4%,6.25%和11.11%,其大于室温,掺杂剂浓度的良好稀释极限为0-6.25%。基于该发现,提出了MN掺杂的BL MOS2是用于高温闪光灯的二维(2D)稀磁半导体(DMS)的候选者。

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