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Interplay between surface chemistry and performance of rutile-type catalysts for halogen production

机译:表面化学与卤素生产催化剂的表面化学和性能之间的相互作用

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Catalytic HBr oxidation is an integral step in the bromine-mediated functionalisation of alkanes to valuable chemicals. This study establishes the relationships between the mechanism of HBr oxidation over rutile-type oxides (RuO2, IrO2, TiO2) and their apparent catalytic performance. Comparison with the well-studied HCl oxidation revealed distinct differences in surface chemistry between HBr and HCl oxidation that impact the stability and activity of the catalysts. The kinetic fingerprints of both oxidation reactions over the three rutile-type oxides investigated are compared using temporal analysis of products, which substantiates the energy profiles derived from density functional theory. The quantitative determination of the halogen uptake under operando conditions using prompt gamma activation analysis demonstrates that RuO2 suffers from extensive subsurface bromination upon contact with hydrogen bromide, particularly at low temperature and low O2?:?HBr ratios, which negatively affects the stability of the catalyst. TiO2 exhibits intrinsically low halogen coverage (30–50%) under all the conditions investigated, due to its unique defect-driven mechanism that renders it active and stable for Br2 production. On the contrary, for HCl oxidation TiO2 is inactive, and the chlorination of the highly active RuO2 is limited to the surface. Differences in the extent of surface halogenation of the materials were also confirmed by high-resolution transmission electron microscopy and explained by the DFT calculations. These insights into the molecular-level processes taking place under working conditions pave the way for the design of the next generation catalysts for bromine production.
机译:催化性HBr氧化是溴介导的烷烃官能化的一体步骤,对宝贵的化学品。本研究建立了金红石型氧化物的HBr氧化机理与2 2,IRO 2 之间的关系,TiO 2 )及其表观催化性能。与所研究的HCl氧化相比显示了HBr和HCl氧化之间的表面化学的明显差异,其影响催化剂的稳定性和活性。使用产物的时间分析比较三金红石型氧化物对三金红石型氧化物的氧化反应的动力学指纹,其实质上源自密度泛函理论。使用促进γ激活分析的卤素摄取下卤素摄取的定量测定表明Ruo <少> <亚> 2 在与溴化氢接触时遭受广泛的地下溴化溴,特别是在低温下,低温和低O <小> <亚> 2 ?HBR比,其负面影响催化剂的稳定性。 TiO 2 在所有调查的条件下表现出本质上低的卤素覆盖率(30-50%),因为其独特的缺陷驱动机制,使其变得活跃且稳定为BR <小> 2 生产。相反,对于HCl氧化,TiO <少> <亚> 2 是无活性的,并且高活性ruo 2 的氯化是限于表面。通过高分辨率透射电子显微镜确认材料表面卤化程度的差异,并通过DFT计算解释。这些见解进入在工作条件下进行的分子水平过程铺平了溴生产下一代催化剂的设计。

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