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Coherent Phonon Transport Measurement and Controlled Acoustic Excitations Using Tunable Acoustic Phonon Source in GHz-sub THz Range with Variable Bandwidth

机译:使用可变带宽的GHz-Sub THz系列中使用可调谐声学声子源的相干声子传输测量和控制声激发

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We experimentally demonstrated a narrowband acoustic phonon source with simultaneous tunabilities of the centre frequency and the spectral bandwidth in the GHz-sub THz frequency range based on photoacoustic excitation using intensity-modulated optical pulses. The centre frequency and bandwidth are tunable from 65 to 381?GHz and 17 to 73?GHz, respectively. The dispersion of the sound velocity and the attenuation of acoustic phonons in silicon dioxide (SiO2) and indium tin oxide (ITO) thin films were investigated using the acoustic phonon source. The sound velocities of SiO2 and ITO films were frequency-independent in the measured frequency range. On the other hand, the phonon attenuations of both of SiO2 and ITO films showed quadratic frequency dependences, and polycrystalline ITO showed several times larger attenuation than those in amorphous SiO2. In addition, the selective excitation of mechanical resonance modes was demonstrated in nanoscale tungsten (W) film using acoustic pulses with various centre frequencies and spectral widths.
机译:我们通过使用强度调制光脉冲的光声激发,通过实验证明了一个窄带声学声子源,其具有中心频率的中心频率和GHz-SUB THz频率范围中的光谱带宽。中心频率和带宽分别可调谐65至381?GHz和17至73?GHz。使用声学声子源研究了声速度和声学声子元声子的分散和氧化铟锡(ITO)薄膜的分散。 SiO2和ITO薄膜的声速在测量的频率范围内与频率无关。另一方面,SiO2和ITO膜两者的声音衰减表现出二次频率依赖性,并且多晶ITO显示比无定形SiO2中的衰减较大的几倍。此外,使用具有各种中心频率和光谱宽度的声脉冲在纳米级钨(W)膜中对机械共振模式的选择性激发。

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