机译:退火对浸入式氧化铋(BioI,Bi_7O_9i_3,Bi_5O_7i)薄膜的结构和光伏性能的影响
Department of Electrical and Mechanical Engineering Nagoya Institute of Technology Gokiso‑cho Showa‑ku Nagoya 466‑8555 Japan;
Department of Electrical and Mechanical Engineering Nagoya Institute of Technology Gokiso‑cho Showa‑ku Nagoya 466‑8555 Japan Nano & Thin Film Lab. Physics Department Faculty of Science South Valley University Qena 83523 Egypt;
Department of Chemistry Walisongo State Islamic University Semarang 50185 Indonesia;
Department of Electrical and Mechanical Engineering Nagoya Institute of Technology Gokiso‑cho Showa‑ku Nagoya 466‑8555 Japan;
Department of Electrical and Mechanical Engineering Nagoya Institute of Technology Gokiso‑cho Showa‑ku Nagoya 466‑8555 Japan;
Department of Electrical and Mechanical Engineering Nagoya Institute of Technology Gokiso‑cho Showa‑ku Nagoya 466‑8555 Japan;
Phase transformation; Bismuth oxyiodide; Dip-SILAR; Structure; Electrical properties;
机译:BioI,Bi_7O_9i_3和Bi_5O_7i材料光学性质的比较研究
机译:退火温度对高压射频磁控溅射制备的柔性碲化铋薄膜的结构,机械和电性能的影响*
机译:厚度和硫退火气氛对通过浸涂技术制备的Cu(2)ZnSNS4薄膜的结构,光学和电性能的影响
机译:基于Sill的Bioi的薄膜热退火效应研究
机译:使用化学退火制备的非晶硅锗膜和器件的性能。
机译:退火对溅射生长铋钛氧化物薄膜结构和光学性能的影响
机译:退火对浸催化的氧化铋(BioI,Bi7O9i3,Bi5O7i)薄膜的结构和光伏性能的影响
机译:退火电沉积碲化铋薄膜的效果