Tailored plasmon-induced transparency in attenuated total reflection response in a metal–insulator–metal structure

摘要

We demonstrated tailored plasmon-induced transparency (PIT) in a metal (Au)–insulator (SiO2)–metal (Ag) (MIM) structure, where the Fano interference between the MIM waveguide mode and the surface plasmon polariton (SPP) resonance mode induced a transparency window in an otherwise opaque wavenumber (k) region. A series of structures with different thicknesses of the Ag layer were prepared and the attenuated total reflection (ATR) response was examined. The height and width of the transparency window, as well as the relevant k-domain dispersion, were controlled by adjusting the Ag layer thickness. To confirm the dependency of PIT on Ag layer thickness, we performed numerical calculations to determine the electric field amplitude inside the layers. The steep k-domain dispersion in the transparency window is capable of creating a lateral beam shift known as the Goos–H?nchen shift, for optical device and sensor applications. We also discuss the Fano interference profiles in a ω???k two-dimensional domain on the basis of Akaike information criteria.