We discovered a technical solution of such outstanding importance that it can trigger new approaches in silicon wet etching processing and, in particular, photovoltaic cell manufacturing. The so called inverted pyramid arrays, outperforming conventional pyramid textures and black silicon because of their superior light-trapping and structure characteristics, can currently only be achieved using more complex techniques involving lithography, laser processing, etc. Importantly, our data demonstrate a feasibility of inverted pyramidal texturization of silicon by maskless Cu-nanoparticles assisted etching in Cu(NO3)2 / HF / H2O2 / H2O solutions and as such may have significant impacts on communities of fellow researchers and industrialists.
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机译：我们发现了一种极为重要的技术解决方案，它可以触发硅湿法刻蚀处理，特别是光伏电池制造中的新方法。所谓的倒金字塔金字塔阵列，由于其优异的光捕获和结构特性，其性能优于常规金字塔纹理和黑硅，目前只能使用涉及光刻，激光加工等的更复杂技术来实现。重要的是，我们的数据证明了其可行性。 Cu（NO 3 ） 2 / HF / H 2 O 2中无掩模铜纳米粒子辅助刻蚀对硅进行倒金字塔形织构化 / H 2 O解决方案，因此可能会对研究人员和实业家的社区产生重大影响。
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