Bottom-up Fabrication of Graphene on Silicon/Silica Substrate via a Facile Soft-hard Template Approach

摘要

In this work, a novel soft-hard template method towards the direct fabrication of graphene films on silicon/silica substrate is developed via a tri-constituent self-assembly route. Using cetyl trimethyl ammonium bromide (CTAB) as a soft template, silica (SiO₂) from tetramethoxysilane as a hard template, and pyrene as a carbon source, the self-assembly process allows the formation of a sandwich-like SiO₂/CTAB/pyrene composite, which can be further converted to high quantity graphene films with a thickness of ~1?nm and a size of over 5?μm by thermal treatment. The morphology and thickness of the graphene films can be effectively controlled through the adjustment of the ratio of pyrene to CTAB. Furthermore, a high nonlinear refractive index n ₂ of ~10?12?m2 W?1 is measured from graphene/silica hybrid film, which is six orders of magnitude larger than that of silicon and comparable to the graphene from chemical vapor deposition process.