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首页> 外文期刊>RSC Advances >Factors affecting formation of deethyl and deisopropyl products from atrazine degradation in UV/H2O2 and UV/PDS
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Factors affecting formation of deethyl and deisopropyl products from atrazine degradation in UV/H2O2 and UV/PDS

机译:在UV / H 2 O 2 和UV / PDS中阿特拉津降解形成脱乙基和脱异丙基产物的因素

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In this study, the formation of deethyl products (DEPs) (i.e., atrazine amide (Atra-imine) and deethylatrazine (DEA)) and deisopropyl product (i.e., deisopropylatrazine (DIA)) from parent atrazine (ATZ) degraded in UV/H2O2 and UV/PDS processes under various conditions was monitored. It was found that SO4˙? displayed a more distinctive preference to the ethyl function group of ATZ than HO˙, leading to the higher ratio of DEPs/DIA in UV/PDS system than that in UV/H2O2 system in pure water. The effects of water matrices (i.e., natural organic matter (NOM), carbonate/bicarbonate (HCO3?/CO32?), and chloride ions (Cl?)) on ATZ degradation as well as formation of DEPs and DIA were evaluated in detail. The degradation of ATZ by UV/PDS was significantly inhibited in the presence of NOM, HCO3?/CO32? or Cl?, because these components could competitively react with SO4˙? and/or HO˙ to generate lower reactive secondary radicals (i.e., organic radicals, carbonate radicals (CO3˙?) or reactive chlorine radicals (RCs)). The yields of these DEPs and DIA products from ATZ degradation were not impacted by NOM or HCO3?/CO32?, possibly due to the low reactivity of organic radicals and CO3˙? toward the side groups of ATZ. Howbeit, the increase of DIA yield companied with the decrease of DEPs yield was interestingly observed in the presence of Cl?, which was attributed to the promotion of Cl? at moderate concentration (mM range) for the conversion of SO4˙? into HO˙. Comparatively, in the UV/H2O2 process, NOM and HCO3?/CO32? exhibited a similar inhibitory effect on ATZ degradation, while the influence of Cl? was negligible. Differing from UV/PDS system, all these factors did not change DEPs and DIA yields in UV/H2O2 process. Moreover, it was confirmed that RCs had a greater selectivity but a lower reactivity on attacking the ethyl function group than that of SO4˙?. These findings were also confirmed by monitoring the degradation of ATZ as well as the formation of DEPs and DIA in three natural waters.
机译:在这项研究中,形成了脱乙基产物(DEPs)( ie ,阿特拉津酰胺(Atra-imine)和脱乙基阿特拉津(DEA))和脱异丙基产物( ie ,脱异丙基阿特拉津( DIA))的母阿特拉津(ATZ)在UV / H 2 O 2 和UV / PDS工艺中降解在各种条件下进行监控。结果发现,SO 4 ˙ 与HO相比,对ATZ乙基官能团的偏爱性更高。 ˙,导致UV / PDS系统中DEPs / DIA的比率高于UV / H 2 O 2 < / small>系统在纯净水中。水基质( ie ,天然有机物(NOM),碳酸盐/碳酸氢盐(HCO 3 ?< / sup> / CO 3 2? )和氯离子(Cl ))对ATZ降解以及DEP和DIA的形成进行了详细评估。在NOM,HCO 3 / CO的存在下,UV / PDS对ATZ的降解具有明显的抑制作用。 3 2? 或Cl ,因为这些成分可以与SO 4 ˙ 和/或HO˙竞争性反应,生成较低的反应性次级自由基( ,有机基团,碳酸盐基团(CO 3 ˙ )或反应性氯自由基(RCs))。 NOM或HCO 3 / CO不会影响ATZ降解的DEP和DIA产品的产量。 3 2? ,可能是由于有机基团和CO 3的反应性较低 ˙ 朝向ATZ侧边。但是,在Cl 存在的情况下,有趣地观察到DIA产量的增加与DEPs产量的下降同时出现,这归因于Cl < sup>? 在中等浓度(mM范围)内用于SO 4 ˙的转化进入HO˙。比较而言,在UV / H 2 O 2 过程中,NOM和HCO 3 / CO 3 2? 对ATZ降解具有相似的抑制作用,而Cl 的影响可忽略不计。与UV / PDS系统不同,所有这些因素都没有改变UV / H 2 O 2 中的DEP和DIA产量。小>过程。此外,已证实,与SO 4 ˙ ?相比,RCs具有更高的选择性,但对乙基官能团的反应性较低。 。通过监测三种天然水域中ATZ的降解以及DEP和DIA的形成也证实了这些发现。

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