Protection of Kapton from Atomic-oxygen Erosion Using Alumina Film Deposited by Magnetron Sputtering

摘要

Ultrathin alumina film was deposited on Kapton substrate by direct current (DC) magnetron sputtering technique and their atomic oxygen (AO) erosion resistance was tested in a ground-based AO simulator. The AO fluence and the erosion yield of the alumina coated Kapton was calculated. The surface thickness and morphology of alumina film was investigated by scanning electronic microscope. The results indicate that as the depositing time increases, alumina film tend to become thick. Under AO environment, the AO erosion resistance of alumina coated Kapton is improved and enhances as the depositing time increases. It is noted that the alumina coated Kapton deposited in 60 min shows the best AO resistance and its erosion yield is two orders of magnitude less than that of pristine Katpon.