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Interlamellar Silylation of Montmorillonite with 3-Aminopropyltriethoxysilane

机译:蒙脱土与3-氨基丙基三乙氧基硅烷的层间硅烷化

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H-montmorillonite was modified by interlayer surface silylation using 3-aminopropyltriethoxysilane and dodecylamine in ethanol without a pre-swelling step. Dodecylamine acts as a gallery expander and silylation catalyst. The evaporation of ethanol from the dispersion yields well-ordered silylated montmorillonites with large basal spacing between 1.50 and 4.20 nm. Solid-state 29Si CP MAS NMR of the silylated samples showed Q2 and Q3 signals as well as T2 and T3 signals. The increase in the relative intensity of Q3 for Q2 and the appearance of T2 and T3 signals was attributed to the grafting of 3-aminopropyltriethoxysilane to the interlayer surface silanol groups.
机译:使用3-氨基丙基三乙氧基硅烷和十二烷基胺在乙醇中的层间表面甲硅烷基化改性H-蒙脱石,而无需预溶胀步骤。十二烷基胺用作画廊膨胀剂和甲硅烷基化催化剂。从分散体中蒸发出乙醇,可得到排列整齐的甲硅烷基化蒙脱石,其基距在1.50至4.20 nm之间。甲硅烷基化样品的固态29Si CP MAS NMR显示Q2和Q3信号以及T2和T3信号。 Q3相对于Q2的相对强度的增加以及T2和T3信号的出现归因于3-氨基丙基三乙氧基硅烷接枝至层间表面硅烷醇基团。

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