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首页> 外文期刊>Bulletin of the Korean Chemical Society >XPS Studies of CO Adsorption on Polycrystalline Nickel Surface
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XPS Studies of CO Adsorption on Polycrystalline Nickel Surface

机译:XPS研究多晶镍表面上CO的吸附

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The chemisorption of CO molecules on polycrystalline nickel surface has been studied by investigating the resulting chemisorbed species with the X-ray photoelectron spectroscopy at temperatures between 300K through 433K. It is found that the adsorbed CO molecules are dissociated by the simple C-O bond cleavage as well as by the disproportionation reaction at temperatures above 373K. The former type dissociation is more favored at low coverages and at elevated temperatures. The isotherms of CO chemisorption are obtained from the xps intensities of C 1s peaks, and then the activation energy of the dissociative adsorption is estimated as a function of the CO exposure. These activation energies are extrapolated to zero coverage to obtain the activation energy of chemisorption in which thermal C-O bond cleavage takes place. The value obtained is 38.1 kJ/mol.
机译:通过在300K至433K之间的温度下用X射线光电子能谱研究所得的化学吸附物质,研究了CO分子在多晶镍表面上的化学吸附。发现吸附的CO分子通过简单的C-O键裂解以及在高于373K的温度下的歧化反应而解离。前一种类型的解离在低覆盖率和高温下更受青睐。从C 1s峰的xps强度获得CO化学吸附的等温线,然后根据CO暴露量估算解离吸附的活化能。将这些活化能外推至零覆盖率以获得化学吸附的活化能,其中发生热C-O键裂解。所得值为38.1kJ / mol。

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