Nanoporous Structure Fabrication in Selective Areas by Block Copolymer Self-Assembly and Electron Beam Lithography

Hiroyuki Suzuki; Reo Kometani; Sunao Ishihara; Shinichi Warisawa

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Nanoporous Structure Fabrication in Selective Areas by Block Copolymer Self-Assembly and Electron Beam Lithography

机译：嵌段共聚物自组装和电子束光刻技术在选择性区域内制备纳米孔结构

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摘要

This paper proposed a facile method to fabricate nanoporous structures in selective areas by block copolymer self-assembly and electron beam lithography.

机译：本文提出了一种通过嵌段共聚物自组装和电子束光刻技术在选择性区域内制备纳米孔结构的简便方法。

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《Journal of Photopolymer Science and Technology》 |2012年第1期|共4页
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Hiroyuki Suzuki; Reo Kometani; Sunao Ishihara; Shinichi Warisawa;
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中图分类光化学物质;
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1. Nanoporous Structure Fabrication in Selective Areas by Block Copolymer Self-Assembly and Electron Beam Lithography [J] . Hiroyuki Suzuki, Reo Kometani, Sunao Ishihara Journal of Photopolymer Science and Technology . 2012,第1期

机译：嵌段共聚物自组装和电子束光刻技术在选择性区域内制备纳米孔结构
2. APS -APS March Meeting 2017 - Event - Constructing ion conducting, nanostructured block copolymer electrolytes through block copolymer self-assembly and block copolymer lithography [J] . Christopher Arges, Yu Kambe, Moshe Dolejsi, Bulletin of the American Physical Society . 2017,第4期

机译：APS -APS 3月会议2017 - 事件 - 构建离子导电，纳米结构嵌段共聚物通过嵌段共聚物自组装和嵌段共聚物光刻电解质
3. Block Copolymers Self-Assembly Allows Obtaining Tunable Micro or Nanoporous Membranes or Depth Filters Based on PMMA; Fabrication Method and Nanostructures [J] . Javier Pinto, Michel Dumon, Miguel A. Rodriguez-Perez The journal of physical chemistry, C. Nanomaterials and interfaces . 2014,第9期

机译：嵌段共聚物自组装可得到基于PMMA的可调节的微孔或纳孔膜或深度过滤器;制备方法和纳米结构
4. Selectively patterned metal nanodots fabrication by combining block copolymer self-assembly and electron beam lithography [C] . Hiroyuki Suzuki, Reo Kometani, Sunao Ishihara, Nanoengineering: Fabrication, properties, optics, and devices IX. . 2012

机译：结合嵌段共聚物自组装和电子束光刻技术选择性图案化金属纳米点的制备
5. III-V compound semiconductor nanostructures by selective area growth using block copolymer lithography. [D] . Li, Ruijuan. 2003

机译：通过使用嵌段共聚物光刻技术进行选择性区域生长的III-V化合物半导体纳米结构。
6. Fabrication of Poly(ethylene glycol) Hydrogel Structures for Pharmaceutical Applications using Electron beam and Optical Lithography [O] . Misuk Bae, Ralu Divan, Kamlesh J. Suthar, -1

机译：电子束和光学光刻技术在医药领域的聚乙二醇水凝胶结构的制备
7. Nanoporous Structure Fabrication in Selective Areas by Block Copolymer Self-Assembly and Electron Beam Lithography [O] . Hiroyuki Suzuki, Reo Kometani, Sunao Ishihara, 2012

机译：通过嵌段共聚物自组装和电子束光刻在选择性区域中的纳米多孔结构制造

Nanoporous Structure Fabrication in Selective Areas by Block Copolymer Self-Assembly and Electron Beam Lithography

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