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首页> 外文期刊>Journal of Ovonic Research >Studies on structural and optical properties of DC reactive magnetron sputtered Cr doped CdO thin films
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Studies on structural and optical properties of DC reactive magnetron sputtered Cr doped CdO thin films

机译:直流反应磁控溅射Cr掺杂CdO薄膜的结构和光学性能研究

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摘要

Cr doped CdO thin films were deposited on mica substrates by D C reactive magnetron sputtering method by varying oxygen flow rates from 1 to 4 sccm. X -ray diffraction peaks indicates that the films were polycrystalline in nature with cubic structure. The intensity of the (2 0 0) peaks increased with the increase of oxygen flow rates. The resistivity increases from 2.12 x 10 -4 to 5.71 x 10 -4 Ω.cm with the increase of oxygen flow rate from 1 to 4 sccm. The carrier concentration of Cr doped CdO thin films decreases from 1.04 x 10 20 to 0.68 x 10 20 cm -3 with the increase of oxygen flow rate from 1 to 4 sccm. The optical transmittance of the thin films increases with the increase of oxygen flo w rate. The optical band gap energy is varied from 2.57 to 2.69 eV with the increase of oxygen flow rate. The optical constants such as absorption coefficient (α), extinction coefficient (k) and refractive index (n) were also determined from the optical transmission data.
机译:通过D C反应磁控溅射方法,通过改变氧气流量从1 sccm到4 sccm,将Cr掺杂的CdO薄膜沉积在云母基板上。 X射线衍射峰表明该膜本质上是具有立方结构的多晶。 (2 0 0)峰的强度随着氧气流速的增加而增加。随着氧气流速从1 sccm增大到4 sccm,电阻率从2.12 x 10 -4增大到5.71 x 10 -4Ω.cm。 Cr掺杂的CdO薄膜的载流子浓度随着氧气流速从1 sccm增大到4 sccm而从1.04 x 10 20减小到0.68 x 10 20 cm -3。薄膜的透光率随着氧气流量的增加而增加。随着氧气流速的增加,光学带隙能量在2.57至2.69 eV之间变化。还从光传输数据确定诸如吸收系数(α),消光系数(k)和折射率(n)的光学常数。

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