...
首页> 外文期刊>Journal of Ovonic Research >Synthesis and characterisation of electrodeposited NiFeCr thin films
【24h】

Synthesis and characterisation of electrodeposited NiFeCr thin films

机译:电沉积NiFeCr薄膜的合成与表征

获取原文
   

获取外文期刊封面封底 >>

       

摘要

NiFeCr thin films were coated on Al substrate by using electrodeposition method at 30 0 C of temperature by varying the current density. In this investigation the bath pH was desired as 3.All the coated films were subjected to the structural and magnetic characterization. The wt.% of Ni, Fe and Cr were determined by using Energy-dispersive X-ray Spectroscopy (EDAX). The particle size and micro hard ness of the electrodeposited NiFeCr films were calculated by using X-ray diffraction (XRD) and Vickers hardness test. The coercivity and saturation magnetization of the coated thin films were found by using Vibrating Sample Magnetometer (VSM). The Scanning Electron Microscopy (SEM) pictures of the coated films reveals that the surface morphology is uniform and it is composed with fine grains. The XRD pattern shows the crystalline nature of the film. The average particle size is 27 nm. From the VSM pattern we conclude that the electrodeposited NiFeCr films have lo wer coercivity 12.194G with higher magnetization value of 0.11660 emu.
机译:通过在30 0 C的温度下通过改变电流密度,通过电沉积方法将NiFeCr薄膜涂覆在Al基板上。在该研究中,期望浴的pH为3。所有涂覆的膜均经过结构和磁表征。通过使用能量色散X射线光谱法(EDAX)确定Ni,Fe和Cr的重量%。使用X射线衍射(XRD)和维氏硬度测试计算电沉积NiFeCr膜的粒径和显微硬度。通过使用振动样品磁强计(VSM)可以发现涂层薄膜的矫顽力和饱和磁化强度。涂膜的扫描电子显微镜(SEM)图片显示,表面形态是均匀的,并且由细晶粒组成。 XRD图谱显示了膜的结晶性质。平均粒径为27nm。从VSM图案可以得出结论,电沉积的NiFeCr薄膜的矫顽力较低,为12.194G,磁化值较高,为0.11660 emu。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号