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Silicon Nanofabrication by Atomic Force Microscopy-Based Mechanical Processing

机译:基于原子力显微镜的机械加工制备纳米硅

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This paper reviews silicon nanofabrication processes using atomic force microscopy (AFM). In particular, it summarizes recent results obtained in our research group regarding AFM-based silicon nanofabrication through mechanochemical local oxidation by diamond tip sliding, as well as mechanical, electrical, and electromechanical processing using an electrically conductive diamond tip. Microscopic three-dimensional manufacturing mainly relies on etching, deposition, and lithography. Therefore, a special emphasis was placed on nanomechanical processes, mechanochemical reaction by potassium hydroxide solution etching, and mechanical and electrical approaches. Several important surface characterization techniques consisting of scanning tunneling microscopy and related techniques, such as scanning probe microscopy and AFM, were also discussed.
机译:本文回顾了使用原子力显微镜(AFM)进行的硅纳米制造工艺。特别是,它总结了我们研究小组中通过基于金刚石尖端滑动的机械化学局部氧化以及使用导电金刚石尖端进行的机械,电气和机电加工而在基于AFM的硅纳米制造中获得的最新结果。微观三维制造主要依靠蚀刻,沉积和光刻。因此,特别强调了纳米机械过程,通过氢氧化钾溶液蚀刻的机械化学反应以及机械和电气方法。还讨论了几种重要的表面表征技术,包括扫描隧道显微镜和相关技术,例如扫描探针显微镜和AFM。

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