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首页> 外文期刊>Journal of nanomaterials >Structural and Mechanical Properties of CrNxCoatings Deposited by Medium-Frequency Magnetron Sputtering with and without Ion Source Assistance
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Structural and Mechanical Properties of CrNxCoatings Deposited by Medium-Frequency Magnetron Sputtering with and without Ion Source Assistance

机译:带有和不带有离子源辅助的中频磁控溅射沉积CrNx涂层的结构和力学性能

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CrNxcoatings were deposited on Si (100) and WC-Co substrates by a home-made medium-frequency magnetron sputtering system with and without thermal filament ion source assistance. The structure and composition of the coatings were characterized by X-ray diffraction, atomic force microscopy, scanning electron microscopy, and transmission electron microscopy. The mechanical and tribological properties were assessed by microhardness and pin-on-disc testing. The ion source-assisted system showed a deposition rate of 3.88 μm/h, much higher than the value 2.2 μm/h without ion source assistance. The CrNxcoatings prepared with ion source assistance exhibited an increase in microhardness (up to 16.3 GPa) and adecrease in friction coefficient (down to 0.48) at the optimized cathode source-to-substrate distance.
机译:CrNx涂层通过自制的中频磁控溅射系统在有无热丝离子源辅助的情况下沉积在Si(100)和WC-Co衬底上。通过X射线衍射,原子力显微镜,扫描电子显微镜和透射电子显微镜表征涂层的结构和组成。机械性能和摩擦学性能通过显微硬度和针盘测试进行评估。离子源辅助系统的沉积速率为3.88μm/ h,远高于没有离子源辅助的2.2μm/ h的值。用离子源辅助制备的CrNx涂层在最优化的阴极源到基底距离下表现出显微硬度的提高(高达16.3 GPa)和摩擦系数的提高(降低至0.48)。

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