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Mechanical and Tribological Properties of Carbon Thin Film with Tungsten Interlayer Prepared by Ion Beam Assisted Deposition

机译:离子束辅助沉积制备钨中间层碳薄膜的力学和摩擦学性能

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Mechanical and tribological properties of the thin carbon film with tungsten interlayer were investigated. The carbon film (130 nm) and the tungsten interlayer (20 nm) were prepared by ion beam assisted deposition (IBAD) method. Both layers were electron beam evaporated and were simultaneously irradiated by the beam of argon (Ar) or nitrogen (N) ions with energy of 700 eV. Mechanical properties of the thin carbon film with tungsten interlayer were investigated by the nanoindentation method. Concerning tribological properties the coefficient of friction was investigated by means of pin on disc tribometer. Phase composition was investigated by X-ray diffraction method (XRD), and bonding characterization of carbon thin film was characterized by Raman spectroscopy.
机译:研究了具有钨夹层的碳薄膜的力学性能和摩擦学性能。通过离子束辅助沉积(IBAD)方法制备碳膜(130 nm)和钨中间层(20 nm)。两层均被电子束蒸发,并同时以700 eV的能量被氩(Ar)或氮(N)离子束照射。用纳米压痕法研究了带钨夹层的碳薄膜的力学性能。关于摩擦学性质,通过盘式摩擦计上的销钉研究了摩擦系数。通过X射线衍射法(XRD)研究相组成,并通过拉曼光谱法表征碳薄膜的键合特性。

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