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首页> 外文期刊>Journal of Metallurgy >Effect of Processing Parameters on the Protective Quality of Electroless Nickel-Phosphorus on Cast Aluminium Alloy
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Effect of Processing Parameters on the Protective Quality of Electroless Nickel-Phosphorus on Cast Aluminium Alloy

机译:工艺参数对铸造铝合金化学镍磷防护性能的影响

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The effects of temperature, pH, and time variations on the protective amount and quality of electroless nickel (EN) deposition on cast aluminium alloy (CAA) substrates were studied. The temperature, pH, and plating time were varied while the surface condition of the substrate was kept constant in acid or alkaline bath. Within solution pH of 5.0–5.5 range, the best quality is obtained in acid solution pH of 5.2. At lower pH (5.0–5.1), good adhesion characterised the EN deposition. Within the range of plating solution pH of 7.0 to 11.5, the highest quantity and quality of EN deposition are obtained on CAA substrate in solution pH of 10.5. It is characterised with few pores and discontinuous metallic EN film. The quantity of EN deposition is time dependent, whereas the adhesion and brightness are not time controlled. The best fit models were developed from the trends of result data obtained from the experiments. The surface morphologies and the chemical composition of the coating were studied using the Jeol JSM-7600F field emission scanning electron microscope.
机译:研究了温度,pH和时间变化对铸造铝合金(CAA)基底上化学镀镍(EN)的保护量和质量的影响。改变温度,pH和电镀时间,同时在酸性或碱性浴中保持基板的表面状态不变。在pH值为5.0-5.5的范围内,在pH值为5.2的酸性溶液中可获得最佳质量。在较低的pH(5.0–5.1)下,良好的附着力是EN沉积的特征。在电镀溶液pH值为7.0至11.5的范围内,在溶液pH为10.5的情况下,在CAA基板上可获得最高数量和质量的EN沉积。它的特点是孔少,金属EN膜不连续。 EN的沉积量与时间有关,而附着力和亮度不受时间控制。从实验获得的结果数据趋势中开发出最佳拟合模型。使用Jeol JSM-7600F场发射扫描电子显微镜研究了涂层的表面形貌和化学成分。

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