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首页> 外文期刊>Journal of Materials Science and Chemical Engineering >Solution Processable Material Derived from Aromatic Triazole, Azomethine and Tris: Preparation and Hole-Buffering Application in Polymer Light-Emitting Diodes
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Solution Processable Material Derived from Aromatic Triazole, Azomethine and Tris: Preparation and Hole-Buffering Application in Polymer Light-Emitting Diodes

机译:芳香族三唑,甲亚胺和Tris衍生的可溶液处理的材料:聚合物发光二极管的制备和空穴缓冲应用

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摘要

This work presents the synthesis of a new hole-buffering material TAZS and its successful application in polymer light-emitting diodes to enhance device performance. The TAZS is composed of aromatic 1,2,4-triazolylcore linked with three trihydroxy tert-butyl terminals via azomethine linkages. The TAZS forms ashomogeneous film deposited by spin-coating process. The HOMO and LUMO levels of TAZS are -5.23 eV and -2.40 eV, respectively, as estimated from cyclic voltammogram. The current density results of hole-only and electron-only devices confirm strong hole-buffering capability of TAZS layer. Multilayer PLEDs with different thickness of TAZS (ITO/PEDOT: PSS/ TAZS (x nm)/SY/ETL/LiF/Al) have been successfully fabricated, using spin-coating process to deposit hole-injecting PEDOT: PSS, TAZS , and emissive SY layers. The PLED with 16 nm TAZS reveals the optimal device performance, with maximum luminance and maximum current efficiency of 19,046 cd/m~(2) and 4.08 cd/A, respectively, surpassing those without TAZS as HBL (8484 cd/m~(2), 2.13 cd/A). The hole-buffering characteristic of TAZS contributes greatly to improved charges’ recombination ratio and enhanced emission efficiency.
机译:这项工作介绍了一种新型的空穴缓冲材料TAZS的合成及其在聚合物发光二极管中的成功应用,以增强器件性能。 TAZS由芳族1,2,4-三唑基核心与三个三羟基叔丁基末端通过偶氮甲胺键连接而成。 TAZS形成通过旋涂工艺沉积的不均匀薄膜。根据循环伏安图估计,TAZS的HOMO和LUMO水平分别为-5.23 eV和-2.40 eV。仅空穴和仅电子器件的电流密度结果证实了TAZS层具有强大的空穴缓冲能力。使用旋涂工艺沉积了空穴注入PEDOT:PSS,TAZS和TAZS(ITO / PEDOT:PSS / TAZS(x nm)/ SY / ETL / LiF / Al)厚度的多层PLED已成功制造。发光SY层。具有16 nm TAZS的PLED展现了最佳的器件性能,最大亮度和最大电流效率分别为19,046 cd / m〜(2)和4.08 cd / A,超过了没有TAZS的HBL(8484 cd / m〜(2 ),2.13 cd / A)。 TAZS的空穴缓冲特性极大地改善了电荷的复合率并提高了发射效率。

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