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首页> 外文期刊>Journal of Low Power Electronics and Applications >0.5 µW Sub-Threshold Operational Transconductance Amplifiers Using 0.15 µm Fully Depleted Silicon-on-Insulator (FDSOI) Process
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0.5 µW Sub-Threshold Operational Transconductance Amplifiers Using 0.15 µm Fully Depleted Silicon-on-Insulator (FDSOI) Process

机译:采用0.15 µm完全耗尽型绝缘体上硅(FDSOI)工艺的0.5 µW亚阈值运算跨导放大器

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We present a low voltage, low power operational transconductance amplifier (OTA) designed using a Fully Depleted Silicon-on-Insulator (FDSOI) process. For very low voltage application down to 0.5 V, two-stage miller-compensated OTAs with both p-channel MOSFET (PMOS) and n-channel MOSFET (NMOS) differential input have been investigated in a FDSOI complementary metal oxide semiconductor (CMOS) 150 nm process, using 0.5 V threshold transistors. Both differential input OTAs have been designed to operate from the standard 1.5 V down to 0.5 V with appropriate trade-offs in gain and bandwidth. The NMOS input OTA has a simulated gain/3 dB-bandwidth/power metric of 9.6 dB/39.6 KHz/0.48 µW at 0.6 V and 46.6 dB/45.01 KHz/10.8 µW at 1.5 V. The PMOS input OTA has a simulated metric of 19.7 dB/18.3 KHz/0.42 µW at 0.4 V and 53 dB/1.4 KHz/1.6 µW at 1.5 V with a bias current of 125 nA. The fabricated OTAs have been tested and verified with unity-gain configuration down to a 0.5 V supply voltage. Comparison with bulk process, namely the IBM 180 nm node is provided and with relevant discussion on the use of FDSOI process for low voltage analog design.
机译:我们介绍了一种低电压,低功率运算跨导放大器(OTA),它是使用完全耗尽型绝缘体上硅(FDSOI)工艺设计的。对于低至0.5 V的极低电压应用,已经在FDSOI互补金属氧化物半导体(CMOS)150中研究了具有p沟道MOSFET(PMOS)和n沟道MOSFET(NMOS)差分输入的两级米勒补偿OTA。纳米工艺,使用0.5 V阈值晶体管。两种差分输入OTA均已设计为从标准1.5 V降至0.5 V,并在增益和带宽上进行了适当的权衡。 NMOS输入OTA在0.6 V时的仿真增益/ 3 dB带宽/功率度量为9.6 dB / 39.6 KHz / 0.48 µW,在1.5 V时为46.6 dB / 45.01 KHz / 10.8 µW。PMOS输入OTA的仿真度量为0.4 V时为19.7 dB / 18.3 KHz / 0.42 µW,1.5 V时为53 dB / 1.4 KHz / 1.6 µW,偏置电流为125 nA。所制造的OTA已通过低至0.5 V电源电压的单位增益配置进行了测试和验证。提供了与批量工艺(即IBM 180 nm节点)的比较,以及有关将FDSOI工艺用于低压模拟设计的相关讨论。

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