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Microstructure of nitrided and nitrocarburized layers produced on a superaustenitic stainless steel

机译:超级奥氏体不锈钢上氮化和氮碳共渗层的微观结构

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The expanded austeniteγNcan be produced in austenitic stainless steels by plasma nitriding, carburizing or nitrocarburizing at low temperatures. This metastable phase presents higher hardness and toughness if compared with traditional nitride layers whilst also maintaining the corrosion resistance. However, the application of plasmas composed by both nitrogen and carbon is technologically recent and the effect of such process on the microstructure and properties of the nitrocarburized layers is still under investigation. In this study, samples of UNS S31254 superaustenitic stainless steel were produced by plasma nitriding and nitrocarburizing at 400°C, 450°C and 500°C for 5h. The plasma treated samples were observed by optical and transmission electron microscopy and also analyzed by X-ray diffraction. The thickness of the layers increased with temperature and the nitrocarburized layers were thicker than nitrided at a given temperature. The presence of expanded austenite was confirmed by X-ray diffraction through its characteristic anomalous shift on the diffracted peaks related to the austenite. Nitride formation on samples produced at 400°C was only identified by transmission electron microscopy where fine rounded particles with 10–15nm size revealed reflections consistent with the CrN cubic chromium nitride. The estimated lattice parameter from the expanded austenite ranged from 0.38 to 0.41nm depending on the employed {hkl} reflection which was found to be 6–11% larger than the untreated austenite lattice parameter.
机译:膨胀奥氏体γN可以在低温下通过等离子渗氮,渗碳或氮碳共渗在奥氏体不锈钢中生产。与传统的氮化物层相比,该亚稳相具有更高的硬度和韧性,同时还保持了耐腐蚀性。然而,由氮和碳组成的等离子体的应用在技术上是最新的,并且这种方法对氮碳共渗层的组织和性能的影响仍在研究中。在本研究中,通过在400°C,450°C和500°C下进行等离子渗氮和碳氮共渗5h来生产UNS S31254超奥氏体不锈钢样品。通过光学和透射电子显微镜观察经等离子体处理的样品,并且还通过X射线衍射分析。层的厚度随温度增加而增加,并且在给定温度下,氮碳共渗层比氮化层更厚。通过X射线衍射,通过在与奥氏体有关的衍射峰上的特征性异常位移,证实了膨胀奥氏体的存在。只有在透射电子显微镜下才能确定在400°C的样品上形成的氮化物,在这种情况下,尺寸为10–15nm的细圆形颗粒显示出与CrN立方氮化铬一致的反射。根据使用的{hkl}反射,从膨胀奥氏体估计的晶格参数范围为0.38至0.41nm,发现该反射率比未处理的奥氏体晶格参数大6-11%。

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