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Computer-aided design-based circuit model of microstrip line for terahertz interconnects technology

机译:太赫兹互连技术的基于计算机辅助设计的微带线电路模型

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In this study, presented a computer-aided design-based circuit model which is applicable to microstrip transmission line for terahertz interconnects technology in circuit simulator. Comparison of modified Kirschning and Jansen for dispersion and modified characteristic impedance for characteristic impedance models with full-wave electromagnetic (EM) simulator are investigated which shows & 1% deviation for w/h range 0.1 a?¤ w/h a?¤ 100, conductor thickness 0.001 a?¤ t/h a?¤ 0.2, wavelength range 8.7 ??m a?¤ ??g a?¤ 8.7 m and substrate permittivity 1.0 a?¤ é? r a?¤ 200. Modified conductor loss for conductor loss and modified dielectric loss (MDL) for dielectric loss are also investigated and compared with EM simulator, which shows deviation of & 1 dB for above said electrical and physical sets of range of parameters. Calculation of line parameters: (f, t), (f, ?±), R(f), L(f), C(f), G(f) by using the effect of dispersion, characteristic impedance and losses which shows & 1% deviation with experimental data available. Accuracy of the circuit model are also verified for interconnects made by aluminium (?? o = 3.7 ?? 107 S/m), tungsten (?? o = 1.0 ?? 107 S/m) and tungstena??silicide (?? o = 3.3 ?? 106 S/m) conductors which used in very large scale integration/ultra large scale integration (VLSI/ULSI) technology.
机译:在这项研究中,提出了一种基于计算机辅助设计的电路模型,该模型适用于电路模拟器中太赫兹互连技术的微带传输线。研究了用全波电磁(EM)仿真器对特性阻抗模型的改进的Kirschning和Jansen的色散和改进的特性阻抗的比较,结果表明& w / h范围为0.1 a?¤w / ha?¤100,导体厚度为0.001 a?¤t / ha?¤0.2,波长范围为8.7?ma?¤?ga?¤8.7 m和基板介电常数为1%时的偏差1.0 a?¤é? 200。还研究了针对导体损耗的修正导体损耗和针对介电损耗的修正介电损耗(MDL),并与EM仿真器进行了比较,结果表明偏差小于。对于上述电气和物理参数范围,为1 dB。通过使用色散,特性阻抗和损耗的影响来计算线参数:(f,t),(f,?±),R(f),L(f),C(f),G(f) &已有1%的偏差(提供实验数据)。还验证了电路模型的精度,适用于由铝(Δεo = 3.7Δε107 S / m),钨(Δεo = 1.0Δε107 S / m)和钨硅化钨(Δεo = 3.3 ?? 106 S / m)导体,用于超大规模集成/超大规模集成(VLSI / ULSI)技术。

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