The shave-off scan method is a unique secondary ion mass spectrometry (SIMS) section processing technique using a gallium focused ion beam (Ga FIB). The sample had a distinctive cross-sectional shape after shave-off scanning, and the slope of the cross section related to the incident angle of the beam that affects sputtering yield. This study investigates sputtering yield as a function of shave-off scan speeds based on cross-sectional shapes examined using a scanning electron microscope (SEM). To conduct a more detailed comparison of the cross sections, the SEM images were converted to an X , Y coordinate system using an in-house program. The sputtering yield decreased as scan speed decreased and incident angle increased. This result opposed the results obtained using conventional raster scanning, and beam profiles could be predicted from the cross-sectional shapes.
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