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Theoretical Study of the Effect of Pressure on the Electronic Structure of Grey Tin

机译:压力对灰锡电子结构影响的理论研究

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A large unit cell (LUC) within intermediate neglect of differential overlap (INDO) formalism has been used to estimate the electronic properties of α - Sn and their pressure dependence. The calculated properties are, in general, in acceptable agreement with the available experimental values except the direct band gap. The calculated properties follow the usual qualitative trends that can be obtained from Hartree-Fock analysis. The increase of pressure is predicted to cause: a linear increase of the direct band gap with a pressure coefficient of 0.06 eV/GPa, a linear increase of the valence band width, a decrease of the conduction band width, a slight decrease of the electronic occupation probability for the s orbital with a slight increase of this probability for the p orbital, and a decrease of the X-ray scattering factors.
机译:在忽略差异重叠(INDO)形式主义的中间忽略下,一个大的晶胞(LUC)已用于估计α-Sn的电子性质及其压力依赖性。通常,除直接带隙外,所计算的性质与可用的实验值在可接受的范围内。计算出的特性遵循可以从Hartree-Fock分析获得的通常的定性趋势。预计压力的增加将导致:压力系数为0.06 eV / GPa时,直接带隙呈线性增加,价带宽度呈线性增加,导带宽度减小,电子的轻微减小s轨道的占位概率,p轨道的占位概率略有增加,X射线散射因子降低。

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