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Optimizing density down-ramp injection for beam-driven plasma wakefield accelerators

机译:优化束流驱动的等离子体尾场加速器的密度下降斜坡注入

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Density down-ramp (DDR) injection is a promising concept in beam-driven plasma wakefield accelerators for the generation of high-quality witness beams. We review and complement the theoretical principles of the method and employ particle-in-cell (PIC) simulations in order to determine constrains on the geometry of the density ramp and the current of the drive beam, regarding the applicability of DDR injection. Furthermore, PIC simulations are utilized to find optimized conditions for the production of high-quality beams. We find and explain the intriguing result that the injection of an increased charge by means of a steepened ramp favors the generation of beams with lower emittance. Exploiting this fact enables the production of beams with high charge ($ensuremath{sim}140ext{ }ext{ }mathrm{pC}$), low normalized emittance ($ensuremath{sim}200ext{ }ext{ }mathrm{nm}$) and low uncorrelated energy spread (0.3%) in sufficiently steep ramps even for drive beams with moderate peak current ($ensuremath{sim}2.5ext{ }ext{ }mathrm{kA}$).
机译:密度下降(DDR)注入是光束驱动等离子体尾场加速器中用于产生高质量见证光束的有希望的概念。我们审查并补充该方法的理论原理,并采用单元内粒子(PIC)模拟,以便确定关于DDR注入的适用性的密度斜率和驱动束电流的几何约束。此外,利用PIC仿真来找到用于生产高质量光束的优化条件。我们发现并解释了一个有趣的结果,即通过陡峭的斜坡注入增加的电荷有助于生成具有较低发射率的光束。利用这一事实,可以产生高电荷的光束($ ensuremath { sim} 140 text {} text {} mathrm {pC} $),低归一化发射率($ ensuremath { sim} 200 text {} text {} mathrm {nm} $)和不相关的低能量散布(0.3%),即使在具有中等峰值电流($ ensuremath { sim} 2.5 text {} text { } mathrm {kA} $)。

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