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Surface-Emission Studies in a High-Field RF Gun based on Measurements of Field Emission and Schottky-Enabled Photoemission

机译:基于场发射和肖特基使能光发射的测量的高场RF枪的表面发射研究

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We report on investigations into the fundamental surface emission parameters, the geometric field enhancement factor ($ensuremath{eta}$) and the work function ($ensuremath{phi}$), by making both field emission and Schottky-enabled photoemission measurements. The measurements were performed on a copper surface in the Tsinghua University $S$-band RF gun in two separate experiments. Fitting our data to the models for each experiment indicate that the traditionally assumed high value of $ensuremath{eta}(ensuremath{pprox}50--500)$ does not provide a plausible explanation of the data, but incorporating a low value of $ensuremath{phi}$ at some sites does. In addition, direct measurements of the surface conducted after the experiment show that $ensuremath{eta}$ is on the order of a few, consistent with our understanding of the electron emission measurements. Thus we conclude that the dominant source of electron emission in high gradient RF cavities is due to low $ensuremath{phi}$ sites, as opposed to the conventionally assumed high $ensuremath{eta}$ sites. The origin of low $ensuremath{phi}$ at these sites is unclear and should be the subject of further investigation.
机译:我们报告了通过使场发射和启用肖特基使能的基本表面发射参数,几何场增强因子($ ensuremath { beta} $)和功函数($ ensuremath { phi} $)的研究。光发射测量。在两个单独的实验中,在清华大学$ S $波段RF枪中的铜表面上进行了测量。将我们的数据拟合到每个实验的模型后,可以得出传统上假定的$ ensuremath { beta}( ensuremath { approx} 50--500)$的高值并不能为数据提供合理的解释,而是结合了在某些网站上$ ensuremath { phi} $的价值较低。另外,在实验之后对表面进行的直接测量表明, ensuremath { beta} $约为几个数量级,这与我们对电子发射测量的理解一致。因此,我们得出结论,在高梯度RF腔中,电子发射的主要来源是由于较低的$ ensuremath { phi} $位置,而不是常规假定的较高的$ ensuremath { beta} $位置。这些地点低 ensuremath { phi} $的起源尚不清楚,应作为进一步调查的对象。

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