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Optimization of laser-plasma injector via beam loading effects using ionization-induced injection

机译:通过电离诱导注入通过束负载效应优化激光等离子注入器

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Simulations of ionization-induced injection in a laser driven plasma wakefield show that high-quality electron injectors in the 50--200 MeV range can be achieved in a gas cell with a tailored density profile. Using the PIC code Warp with parameters close to existing experimental conditions, we show that the concentration of ${mathrm{N}}_{2}$ in a hydrogen plasma with a tailored density profile is an efficient parameter to tune electron beam properties through the control of the interplay between beam loading effects and varying accelerating field in the density profile. For a given laser plasma configuration, with moderate normalized laser amplitude, ${a}_{0}=1.6$ and maximum electron plasma density, ${n}_{e0}=4ifmmodeimeselseexttimesi{}{10}^{18}ext{ }ext{ }{mathrm{cm}}^{ensuremath{-}3}$, the optimum concentration results in a robust configuration to generate electrons at 150 MeV with a rms energy spread of 4% and a spectral charge density of $1.8ext{ }ext{ }mathrm{pC}/mathrm{MeV}$.
机译:在激光驱动的等离子流场中电离诱导注入的模拟表明,在具有定制密度分布的气室中,可以实现50--200 MeV范围内的高质量电子注入器。使用具有接近现有实验条件的参数的PIC代码Warp,我们显示具有定制密度分布的氢等离子体中$ { mathrm {N}} _ {2} $的浓度是调节电子束特性的有效参数通过控制光束载荷效应和密度分布中变化的加速场之间的相互作用。对于给定的激光等离子体配置,具有适度的标准化激光振幅$ {a} _ {0} = 1.6 $和最大电子等离子体密度$ {n} _ {e0} = 4 ifmmode times else texttimes fi {} {10} ^ {18} text {} text {} { mathrm {cm}} ^ { ensuremath {-} 3} $,最佳浓度可产生稳健的结构,从而在150 MeV的电压下产生电子均方根能量扩散为4%,频谱电荷密度为$ 1.8 text {} text {} mathrm {pC} / mathrm {MeV} $。

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