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首页> 外文期刊>Physical Review & Research International >Metal Oxide Buffer Layer Thickness Influence on the Performance of Pentacene Thin Film Transistors
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Metal Oxide Buffer Layer Thickness Influence on the Performance of Pentacene Thin Film Transistors

机译:金属氧化物缓冲层厚度对并五苯薄膜晶体管性能的影响

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摘要

High performance top contact organic thin-film transistors (TC OTFTs) with bilayer electrodes (MoO3/Au) are fabricated. The interface properties of metal electrodes with organic active layer have an important effect on the OTFTs performance. We demonstrate the MoO3 layer is working as a buffer layer which can lower the charge injection barrier and reduce the contact resistance, and study the devices characteristics changing with the buffer layer thickness. Comparing with conventional TC OTFTs, the organic transistor with 10nm buffer layer shows the highest performance with field-effect mobility increasing from 0.17 to 0.69 cm2/V?s, threshold voltage downshifts from –13 to –5.3 V, and the on/off current ratio is about 50 times higher.
机译:制作了具有双层电极(MoO3 / Au)的高性能顶部接触有机薄膜晶体管(TC OTFT)。具有有机活性层的金属电极的界面特性对OTFT的性能具有重要影响。我们证明了MoO3层起着缓冲层的作用,可以降低电荷注入势垒并降低接触电阻,并研究器件特性随缓冲层厚度的变化而变化。与传统的TC OTFT相比,具有10nm缓冲层的有机晶体管表现出最高的性能,场效应迁移率从0.17增至0.69 cm2 / V?s,阈值电压从–13降至–5.3 V,开/关电流比率大约高50倍。

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