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Estimation of leakage power and delay in CMOS circuits using parametric variation

机译:使用参数变化估算CMOS电路中的泄漏功率和延迟

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Summary With the advent of deep-submicron technologies, leakage power dissipation is a major concern for scaling down portable devices that have burst-mode type integrated circuits. In this paper leakage reduction technique HTLCT (High Threshold Leakage Control Transistor) is discussed. Using high threshold transistors at the place of low threshold leakage control transistors, result in more leakage power reduction as compared to LCT (leakage control transistor) technique but at the scarifies of area and delay. Further, analysis of effect of parametric variation on leakage current and propagation delay in CMOS circuits is performed. It is found that the leakage power dissipation increases with increasing temperature, supply voltage and aspect ratio. However, opposite pattern is noticed for the propagation delay. Leakage power dissipation for LCT NAND gate increases up to 14.32%, 6.43% and 36.21% and delay decreases by 22.5%, 42% and 9% for variation of temperature, supply voltage and aspect ratio. Maximum peak of equivalent output noise is obtained as 127.531 nV/Sqrt(Hz) at 400 mHz.
机译:概述随着深亚微米技术的出现,泄漏功率耗散成为缩小具有突发模式型集成电路的便携式设备的主要考虑因素。在本文中,讨论了减少泄漏的技术HTLCT(高阈值泄漏控制晶体管)。与LCT(泄漏控制晶体管)技术相比,在低阈值泄漏控制晶体管的位置使用高阈值晶体管会导致更多的泄漏功率降低,但会造成面积和延迟的降低。此外,进行参数变化对CMOS电路中的泄漏电流和传播延迟的影响的分析。发现泄漏功耗随着温度,电源电压和纵横比的增加而增加。但是,对于传播延迟,注意到相反的模式。由于温度,电源电压和纵横比的变化,LCT NAND门的泄漏功耗增加高达14.32%,6.43%和36.21%,延迟减少22.5%,42%和9%。在400 mHz处获得的等效输出噪声的最大峰值为127.531 nV / Sqrt(Hz)。

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