The interaction processes of silicon tetrafluoride and hexafluorosilicates with hydrogen-containing and oxygenated substances: a thermodynamic analysis

摘要

In the paper, the thermodynamic calculations have shown that at the temperatures above 1300 K, the main silicon-containing substance is silicon dioxide in the Si-F-H-O element system, and the main fluorine-containing one is hydrogen fluoride in the same system. The mentioned temperature was realized during the interaction reactions between silicon tetrafluoride, fluorosilicates and hydrogen-containing, oxygen-containing substances in the combustion mode. The high-temperature treatment of silicon tetrafluoride and fluorosilicates in the combustion mode can become the basis of industrial technology for hydrogen fluoride production.